Semi-Automatic Resist Coater
It is possible to select an optimal acceleration based on the viscosity of the resist coating agent! We also pay attention to maintainability.
This is an introduction to our small resist coater. Resist coating material is applied to glass substrates using a spinner. We pay attention to airflow control within the chamber and maintenance, allowing for optimal acceleration selection based on the viscosity of the resist coating material. *For more details, please refer to the PDF document or feel free to contact us. Wafer, batch-type cleaning equipment, coating and developing equipment, spin cleaning equipment, spin coater, semiconductor manufacturing equipment, resist coating equipment, coating equipment, coating uniformity, low price, photolithography process, batch substrate cleaning machine, batch spin cleaning machine, surface treatment, wafer cleaning equipment.
- Company：ソフエンジニアリング
- Price：Other
